Wafer cleaning machine
Time:2023-05-13 13:58:45 Hits:127
Wafer cleaning machine


Equipment parameters

Machine size

3600(L)*1800(W)*2150(H)(mm)

pressure

5kg/cm ², with a flow rate of over 200LPM

voltage

50/60HZ,3P220V15KW

control system

MitsubishiPLC

steam

DIWater3kgf/cm2 over/1’

exhaust

6 "exhaust



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