Equipment specifications and parameters | |
SPIN COATER | |
Film thickness uniformity | ≦±3% |
Substrate size | G2以下 |
Tact time | <60s |
Equipment specifications and parameters | |
Equipment specifications and parameters | |
Film thickness uniformity | ≦±10% |
Substrate size | G3.5以下 |
Tact time | <25s |
Equipment specifications and parameters | |
SLIT COATER | |
Film thickness uniformity | ≦±3% |
Substrate size | G6以下 |
Tact time | <40s |
Equipment specifications and parameters | |
SLIT COATER | |
Film thickness uniformity | 50~500um |
Substrate size | 32寸以下 |
Tact time | <35s |
